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Journal of Micro-Nanolithography MEMS and MOEMS

来源: 树人论文网 浏览次数:294次
创刊时间:2007
周期:Quarterly
ISSN:1932-5150
影响因子:1.193
是否开源:No
年文章量:77
录用比:容易
学科方向:工程:电子与电气
研究方向:工程技术
通讯地址:SPIE-SOC PHOTOPTICAL INSTRUMENTATION ENGINEERS, 1000 20TH ST, PO BOX 10, BELLINGHAM, USA, WA, 98225
官网地址:http://www.spie.org/publications/journals/journal-of-micro/nanolithography-mems-and-moems
投稿地址:https://jm3.msubmit.net/cgi-bin/main.plex
网友分享经验:较慢,6-12周

Journal of Micro-Nanolithography MEMS and MOEMS杂志中文介绍

《微纳米光刻机MEMS和MOEMS杂志》(JM3)发表了有关光刻、制造、包装和集成技术的科学、发展和实践的论文,以满足电子、MEMS、MOEMS和光子学行业的需要。这类装置的范围很广,包括生物医学微装置、微流体、传感器和执行器、自适应光学和数字微镜。范围广泛,有助于促进期刊服务的社区之间的协同作用和利益。

Journal of Micro-Nanolithography MEMS and MOEMS杂志英文介绍

The Journal of Micro-Nanolithography MEMS and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro-Nanolithography MEMS and MOEMS影响因子

工程:电子与电气领域相关期刊
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