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INTEGRATED FERROELECTRICS

来源: 树人论文网 浏览次数:167次
周期:Monthly
ISSN:1058-4587
影响因子:0.486
是否开源:No
年文章量:187
录用比:容易
学科方向:工程:电子与电气
研究方向:工程技术
通讯地址:TAYLOR & FRANCIS LTD, 4 PARK SQUARE, MILTON PARK, ABINGDON, ENGLAND, OXON, OX14 4RN
官网地址:http://www.tandfonline.com/toc/ginf20/current
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网友分享经验:约3.0个月

INTEGRATED FERROELECTRICS杂志中文介绍

集成铁电学为从事集成铁电器件研究、设计、开发、制造和应用的电子工程师、物理学家、过程和系统工程师、陶艺家和化学家提供了一个国际性、跨学科的论坛。这种器件将铁电薄膜和半导体集成电路芯片结合起来。其结果是一种新型的电子器件,它结合了铁电材料独特的非挥发性存储器、热释电、压电、光折变、硬辐射、声学和/或介电性能,以及半导体集成电路技术的动态存储器、逻辑和/或放大性能、小型化和低成本优势。

INTEGRATED FERROELECTRICS杂志英文介绍

Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.

INTEGRATED FERROELECTRICS影响因子

工程:电子与电气领域相关期刊
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