CHEMICAL VAPOR DEPOSITION

从2016年起，《化学气相沉积》杂志将作为《先进材料界面》杂志的一部分发表。请点击这里获取更多信息。化学气相沉积(CVD)发表关于化学气相沉积和相关技术的所有方面的评论、短通信和全文，以及其他介绍意见、新闻、会议信息和书评的文章。所有论文都经过同行评审。该杂志为化学家、物理学家和工程师提供了一个统一的论坛，他们关于化学气相沉积的出版物在过去已经遍布于无机化学、材料化学、有机金属学、应用物理和半导体技术、薄膜和陶瓷加工的期刊上。

From 2016, the journal Chemical Vapor Deposition will be published as a section of the journal Advanced Materials Interfaces.Please click here for more information.Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews.All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.